Plasmionique offers various Table Top systems for cleaning, Reactive Ion Etching (RIE), Plasma-Enhanced Chemical Vapour Deposition (PECVD). Processes are carried out using RF or microwave generated plasma in low-pressure regimes.
Plasmionique’s Table Top CVD / ALD / PECVD / RIE Systems are designed to serve as versatile surface treatment systems.
Typically measuring around 32” in width, 22” in depth, and 24” in height, these systems have the following features:
- Deposition chamber having 8” in diameter and about 6″ to 10″ in height.
- Use of capacitively or inductively coupled plasma sources.
- Dry or wet mechanical pump with 6 to 9 cfm capacity. Addition of optional turbo pump station with nominal speed up to 80 to 90 L/s for ICP sources.
- Typically computer controlled, equipped with a programmable RF generator (120 W – 300 W) with its automatic matching network.
- Addition of optional water-cooled or heated (up to 300 °C) substrate holders.
- Inclusion of substrates up to 4” in diameter.
- Incorporation of up to two (2) process gas lines and inclusion of an automated vent line.
All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.
An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 10” touch screen that also facilitates seamless interaction with the system control software.
Elevate your surface treatment capabilities with Plasmionique Table Top Systems, where innovation meets versatility.
