Gas, Vapour and Liquid Process Control Systems

Gas, Vapour and Liquid Process Control systems have their independent processor, allowing to be integrated in any existing system for dedicated control of process gases, or liquids or vapours generated from liquid or solid sources.

These systems could be upgraded to measure and control pressure or other instruments and transform a manually operated system to a fully or semi automated system, with data acquisition using Plasmionique’s proprietary, PLASMICON, process monitoring and control software. All our systems come equipped with PLASMICON, to allow a high-fidelity real-time monitoring and control environment. Some of its features include:

• Intuitive graphical user interface
• Multi-step programming for process recipes
• Plotting and data-logging
• Program mode for programming multi-step processes
• Alarms and interlocks to protect system hardware and warn of unsafe conditions
• Real-time plotting and data logging
• Remote support interface
• Options for Optical Emission and Mass spectroscopy Diagnostic interfaced to process control Plasma Source Option
• Optional Remote ICP source for enhance reactive sputter deposition
• Independent power supply and integrated control included