- Sputter Deposition Systems
Table Top
Plasmionique’s Table Top Sputter Deposition Systems are designed to serve as versatile surface treatment systems…
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Plasmionique’s Sputter Deposition Systems are highly versatile and come equipped with our proprietary sputtering cathodes. They are designed for high target utilization efficiency and are available in balanced and unbalanced magnetic configurations in circular or rectangular shapes.
Our Sputter Deposition Systems are versatile magnetron sputter deposition tools for thin-film coatings. The typical target sizes can range from one to four inches in diameter and could be operated with RF, DC or pulse-DC modes. Magnetron geometries can be balanced or unbalanced. Substrate rotation, heating, and biasing are used to control the sputter deposition process.
These systems can include ICP and Ion Sources for Enhanced Reactive Sputter Deposition. Substrate rotation, heating, biasing, and computer controlled axial motions are options available on all systems.
This product can be integrated in the following system formats:
Plasmionique’s Table Top Sputter Deposition Systems are designed to serve as versatile surface treatment systems…
Plasmionique’s Compact Sputter Deposition Systems seamlessly blend the efficiency of a Table Top form factor…
Plasmionique’s Full Size Sputter Deposition Systems are designed for unparalleled flexibility and feature-rich functionality. This…
Plasmionique’s Roll-To-Roll Sputter Deposition Systems accommodate an extensive array of sources, processes, and features, empowering…