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Plasmionique offers various Full Size systems for cleaning, reactive ion etching (RIE), and plasma-enhanced chemical vapor deposition (PECVD). The processes are carried out using plasma generated by RF or microwaves in low-pressure regimes.

Plasmionique’s Full Size CVD / ALD / PECVD / RIE Systems are designed to provide unparalleled flexibility and numerous features. This format accommodates a wide range of sources, processes, and functionalities, offering maximum adaptability for your applications.

The systems generally measure 60 inches in height, 55 inches in width, and 32 inches in depth, and include the following features:

  • Deposition chamber of 12 to 14 inches in diameter and approximately 8 to 14 inches in height.
  • Use of capacitively or inductively coupled plasma sources.
  • Dry or wet mechanical pump with a capacity of 6 to 9 cfm. An optional turbo-molecular pump with a rated speed of 250 L/s or more for ICP sources can be added.
  • Programmable RF generator (300 W or more) with its automatic impedance matching network. Power supply controlled by computer.
  • Option to include water-cooled or heated substrate holders (up to 800°C). For ICP sources, the inclusion of biased substrate holders is possible.
  • Optional control of the axial movement of the substrate holder (manual or automatic).
  • Inclusion of 4-inch diameter substrates or larger.
  • Incorporation of up to four (4) process gas lines and inclusion of an automated vent line. To accommodate additional gas lines, additional gas inlets and space on the gas panel can be provided.

All systems include the possibility of automating processes using recipes integrated into our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring and control.

An advanced control system is also included, allowing full automation of the deposition process. With our data acquisition system and a user-friendly 24-inch touch screen, real-time data monitoring is made easy.

Elevate your surface processing capabilities with Plasmionique’s Full Size systems, where innovation meets versatility.

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