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Plasmionique offers various plasma reactors for cleaning, etching, Plasma-Enhanced Chemical Vapour Deposition (PECVD) and synthesis of nanostructured materials. Processed are carried out using DC, HF, RF or microwave generated plasma, in atmospheric or low-pressure regimes.

Plasmionique’s horizontal CVD furnaces have the option to operate with single or multiple heating zones. Combined with our patented flow management systems, our Thermal Evaporation Tube Furnaces offer unparalleled flexibility.

These systems consist of a quartz tube with an outer diameter of around 100 mm or larger, serving as the vacuum chamber. Both ends of the quartz tube are sealed with O-rings for vacuum compatibility. Sample loading and unloading are typically accomplished using rail-mounted substrate holders, ensuring precise placement for improved accuracy and reproducibility.

The tube is enveloped by resistive heating elements embedded in an insulating material, enabling temperatures as high as 1100 °C. Various configurations such as single-zone, double-zone, and triple-zone are available to provide accurate temperature control or establish a temperature gradient within the furnace during the process.

Plasmionique’s Tube Furnaces can integrate up to six process gas lines, each equipped with dedicated mass flow controllers and pneumatic shut-off valves, along with a separate chamber vent line. Additionally, up to two precursor vapor injection lines, featuring heated bubbler reservoirs, can be incorporated. All gases are injected from one end of the tube furnace, while the opposite end is designated for the pumping line and pressure gauges.

For PECVD applications, an inductively coupled plasma source with water-cooled coils can be optionally added to one end of the quartz tube. This plasma source can utilize a dedicated gas line or operate with some of the included process gas lines, providing further adaptability to suit diverse processing needs.

Elevate your research capabilities with Plasmionique’s Tube Furnaces, where innovation meets versatility.

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