Plasmionique’s PECVD Reactors use various microwave coupling modes to generate a plasma, including Single Mode cavity, Multi-Mode cavity, Standing Wave, Surface waves and Electron Cyclotron Resonance (ECR) mechanisms.
Plasmionique’s Table Top PECVD Reactors are designed to serve as versatile modes to generate plasma using various microwave coupling modes to meet your application needs.
Typically measuring around 32” in width, 22” in depth, and 24” in height, these systems have the following features:
- Deposition chamber having 8” in diameter and about 14” in height.
- Compact turbo pump station with nominal speed up to 80 to 90 L/s. Base pressure low 10-6 Torr to mid 10-7 Torr ensuring a clean chamber with no additional components.
- Typically computer controlled, equipped with a programmable 200 W or 450 W solid state RF generator with its internal automatic matching circuit.
- Addition of water-cooled ECR (low pressure) or Collisional (high pressure) plasma sources.
- Substrate holders with an option to be water-cooled or heated up to 300 °C. All heating circuits are regulated through a fully configurable PID loop with auto-tuning, ramping, and output limiting capabilities.
- Inclusion of substrates up to 4” in diameter.
- Incorporation of up to two (2) process gas lines and inclusion of an automated vent line.
All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.
An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 10” touch screen that also facilitates seamless interaction with the system control software.
Elevate your surface treatment capabilities with Plasmionique Table Top Systems, where innovation meets versatility.
