
Plasmionique’s Compact MWPlasma / MWPECVD Reactors use various microwave coupling modes to generate a plasma, including Single Mode cavity, Multi-Mode cavity, Standing Wave, Surface waves and Electron Cyclotron Resonance (ECR) mechanisms.
Our Compact MWPlasma / MWPECVD Reactors seamlessly blend the efficiency of a Table Top form factor with the adaptability and upgradability of our larger models.
The systems typically measure 46” in height, 30” in width, and 25” in depth and have the following features:
- Deposition chamber having 8” – 10″ in diameter and about 10” in height.
- Pumping system with nominal speed of 80 to 300 L/s. Base pressure low 10-6 Torr to mid 10-7 Torr ensuring a clean chamber with no additional components.
- Typically computer controlled, equipped with a programmable 200 W or 450 W solid state RF generator with its automatic matching circuit.
- Addition of one (1) to three (3) water-cooled ECR (low pressure) or Collisional (high pressure) plasma sources.
- Rotary substrate holders with an option to be water-cooled or heated up to 300 °C and/or biased. All heating circuits are regulated through a fully configurable PID loop with auto-tuning, ramping, and output limiting capabilities.
- Inclusion of substrates up to 4” in diameter.
- Incorporation of up to four (4) process gas lines and inclusion of an automated vent line.
All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.
An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 15” touch screen that also facilitates seamless interaction with the system control software.
Elevate your surface treatment capabilities with Plasmionique Compact systems, where innovation meets versatility.