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Our series of Sputter Deposition Systems are highly versatile and come equipped with Plasmionique Inc.’s proprietary sputtering cathodes. They are designed for high target utilization efficiency and are available in balanced and unbalanced magnetic configurations in circular or rectangular shapes.

Plasmionique’s Full Size Sputter Deposition Systems are designed for unparalleled flexibility and feature-rich functionality. This form factor accommodates an extensive array of sources, processes, and features, empowering your applications with maximum adaptability. 

The systems typically measure 60” in height, 55” in width, and 32” in depth and have the following features: 

  • Deposition chamber having 12” – 16″ in diameter and about 24” in height. 
  • Pumping system with nominal speed of 450 L/s or higher. Base pressure low 10-6 Torr to mid 10-7 Torr ensuring a clean chamber with no additional components.
  • Typically computer controlled, power supply options include: multiple DC, DC/Pulsed-DC (1 kW) and RF generators (300 W – 600W) with their automatic matching network.
  • Addition of water-cooled magnetrons of different sizes ranging from 2” to 4”.
  • Minimum of one quartz crystal microbalance used for thickness measurement and deposition rate control.
  • Rotary substrate holders have an option to be heated up to 800 °C and can have biasing capabilities added. All heating circuits are regulated through a fully configurable PID loop with auto-tuning, ramping, and output limiting capabilities. Optionally, an automated axial motion control may be added.
  • Inclusion of substrates up to 6” in diameter.
  • Incorporation of up to four (4) process gas lines and inclusion of an automated vent line. For more gas lines, a gas pod could be provided.

All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.

An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 24” touch screen that also facilitates seamless interaction with the system control software.

Elevate your surface treatment capabilities with Plasmionique Full Size systems, where innovation meets versatility.