The systems typically measure 60” in height, 55” in width, and 32” in depth and have the following features: 

Downstream Plasma Sources:

• Downstream plasma equipped with a 3″ to 5″ quartz chamber.
• Power of 1 kW to 10 kW with options of manual or automatic tuning. 
• Operational from low pressure (lower power of 1-3 kW) to atmospheric pressure (higher powers of 6-10 kW).

ECR/Collisional Plasma Sources: 

• Deposition chamber having 12″ – 14″ in diameter and about 10″ -14″ in height. 
• Turbo pump station with nominal speed of 450 L/s or higher. Base pressure low 10^-6 Torr to mid 10^-7 Torr ensuring a clean chamber with no additional components.
• Addition of multiple water-cooled ECR (low pressure) or Collisional (high pressure) plasma sources.
• Computer controlled, multiple programmable 450 W solid state RF generators with their internal automatic matching circuits. 
• Substrate holders may water-cooled or heated (up to 800 °C) and can have biasing capabilities added. All heating circuits are regulated through a fully configurable PID loop with auto-tuning, ramping, and output limiting capabilities. 
• Inclusion of substrates up to 6” in diameter.
• Incorporation of up to four (4) process gas lines and inclusion of an automated vent line. For more gas lines, a gas pod could be provided.

All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.

An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 24” touch screen that also facilitates seamless interaction with the system control software.

Elevate your surface treatment capabilities with Plasmionique Full Size systems, where innovation meets versatility.