Plasma-based ion implanters are an economical and versatile substitute for conventional ion beam implanters for surface engineering, as well as shallow depth doping for nanoelectronics, photonics or radioisotope implantations for medical applications. The plasma-immersed ion implantation process is a conformal surface treatment and allows for implantation on structures having 3D topography.
Plasmionique’s Full Size Plasma / Ion / Neutral Sources systems are designed for unparalleled flexibility and feature-rich functionality. This form factor accommodates an extensive array of sources, processes, and features, empowering your applications with maximum adaptability.
The systems typically measure 60” in height, 55” in width, and 32” in depth and have the following features:
All systems include the possibility to automate processes using recipes embedded within our PLASMICON control software. Additionally, all systems have an option to integrate optical spectroscopy for process monitoring/control.
An advanced control system is also included allowing full automation of the deposition process, a data acquisition system; real time data monitoring using a user-friendly 24” touch screen that also facilitates seamless interaction with the system control software.
Elevate your surface treatment capabilities with Plasmionique Full Size systems, where innovation meets versatility.